发明名称 SAMPLE STAGE
摘要 PURPOSE:To eliminate beam position error due to leakage magnetic field from an object lens by forming a sample holder and a pedestal with a semiconductor material such as ceramics or a semiconductor material covered with conductive material thin film on the occasion of providing a pedestal for placing sample holder on the sample stage which constitutes an electron beam drawing device. CONSTITUTION:The square pedestal 1 having the sliding legs 3 at the lower surfaces of four corners is provided on a rectangular surface plate 4 having a flat Y guide 10 protruded upward to both ends provided opposingly and a roller 9 provided at the end surface of X reference guide 5 between the sliding legs is rolled on the Y guide 10. The Y reference guide groove 6' is formed at the surface plate 4 orthogonal to the X guide 5, a Y slide rod 8 is inserted thereto and the pedestal 1 is slid in the direction Y by a drive shaft 12. Moreover, the sample holder 2 is fixed on the pedestal 1 and in this case both pedestal 1 and holder 2 are formed by semiconductor material and thereby induction current by leakage magnetic field can be reduced remarkably and electron beam projecting position error can be eliminated.
申请公布号 JPS6037729(A) 申请公布日期 1985.02.27
申请号 JP19830146077 申请日期 1983.08.10
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 TSUYUSAKI HARUO;IDO SATOSHI;HOSOKAWA TERUO;FUJINAMI AKIHIRA
分类号 G03F7/20;H01J37/34;H01L21/027;H01L21/30 主分类号 G03F7/20
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