发明名称 |
SAMPLE STAGE |
摘要 |
PURPOSE:To eliminate beam position error due to leakage magnetic field from an object lens by forming a sample holder and a pedestal with a semiconductor material such as ceramics or a semiconductor material covered with conductive material thin film on the occasion of providing a pedestal for placing sample holder on the sample stage which constitutes an electron beam drawing device. CONSTITUTION:The square pedestal 1 having the sliding legs 3 at the lower surfaces of four corners is provided on a rectangular surface plate 4 having a flat Y guide 10 protruded upward to both ends provided opposingly and a roller 9 provided at the end surface of X reference guide 5 between the sliding legs is rolled on the Y guide 10. The Y reference guide groove 6' is formed at the surface plate 4 orthogonal to the X guide 5, a Y slide rod 8 is inserted thereto and the pedestal 1 is slid in the direction Y by a drive shaft 12. Moreover, the sample holder 2 is fixed on the pedestal 1 and in this case both pedestal 1 and holder 2 are formed by semiconductor material and thereby induction current by leakage magnetic field can be reduced remarkably and electron beam projecting position error can be eliminated. |
申请公布号 |
JPS6037729(A) |
申请公布日期 |
1985.02.27 |
申请号 |
JP19830146077 |
申请日期 |
1983.08.10 |
申请人 |
NIPPON DENSHIN DENWA KOSHA |
发明人 |
TSUYUSAKI HARUO;IDO SATOSHI;HOSOKAWA TERUO;FUJINAMI AKIHIRA |
分类号 |
G03F7/20;H01J37/34;H01L21/027;H01L21/30 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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