发明名称 PREPARATION OF PHOTO MASK
摘要 PURPOSE:To permit highly precise lifting-off by providing a film capable of absorbing light but transmitting no light to the rear surface of a glass substrate whereby the incidence of reflected light on a photo resist film on the surface of the substrate is prevented.
申请公布号 JPS52146180(A) 申请公布日期 1977.12.05
申请号 JP19760062652 申请日期 1976.05.29
申请人 FUJITSU LTD 发明人 ARII KATSUYUKI
分类号 G03F1/00;G03F1/46;H01L21/027;H01L21/302 主分类号 G03F1/00
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