发明名称 PLASMA CVD DEVICE
摘要 PURPOSE:To form a uniform film without uneven electric discharge with a device which forms a deposited film on the outside surface of a rotary drum by the discharge of an outside circumferential cathode electrode in a gaseous raw material by moving vertically and controllably the cylindrical cathode electrode. CONSTITUTION:A drum 2 which is rotated by a shaft 9 in a vacuum 7 chamber 13 insulated by an insulator 4 is heated to an adequate temp. by an electric heater. A doping gas 6 such as gaseous silane flows out from fine holes 11 formed on the inside circumferential surface of a cylindrical cathode 1. When a high frequency voltage is impressed to the cathode electrode 1, the radical reaction of the emitted electrons with gaseous molecules is performed by which a deposited film is formed on the outside surface of the drum 1. The cathode 1 is vertically moved at an adequate control speed by a revolving shaft 12, by which the uneven discharge of the deposited film is eliminated and a uniform film is formed on the outside circumferential surface of the drum 2.
申请公布号 JPS6036660(A) 申请公布日期 1985.02.25
申请号 JP19830143778 申请日期 1983.08.08
申请人 CANON KK 发明人 NEMOTO SHIGEMITSU
分类号 C23C16/50;C23C16/505;G03G5/08;G03G5/082;H01L21/205;H01L31/0248 主分类号 C23C16/50
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