发明名称 ACTIVATING METHOD FOR ELECTROLESS COPPER PLATING
摘要 PURPOSE:To improve the characteristics of electroless copper plating by immersing an article to be plated in an aqueous soln. contg. a complex compound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with aminosaccharide, pulling up the article, and heating it to produce metallic Pd or Cu. CONSTITUTION:An article to be plated is immersed in an aqueous soln. of a complex coumpound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with aminosaccharide. The concn. of the complex compound in the aqueous soln. is <=1wt% when the compound is expressed in terms of Pd or Cu. The article is pulled up from the soln., and it is heated to 30- 200 deg.C to form metallic Pd or Cu particles on the surface of the article. The article is then subjected to electroless copper plating by a conventional method.
申请公布号 JPS6036671(A) 申请公布日期 1985.02.25
申请号 JP19830144637 申请日期 1983.08.08
申请人 HITACHI KASEI KOGYO KK 发明人 MATSUZAKI ISAO;YOKONO HARUKI;ISHIBASHI TAKEHIKO
分类号 C23C18/30;C23C18/28;C23C18/40;H05K3/18 主分类号 C23C18/30
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