发明名称 MANUFACTURE OF DUSTPROOF COVER FOR PHOTOMASK
摘要 PURPOSE:To obtain easily the titled cover of a uniform thickness with high reproducibility by adhering a frame to a thin nitrocellulose film formed on a smooth substrate and by immersing the film in water to strip the substrate. CONSTITUTION:A smooth substrate such as a silicon substrate having >=lambda/4 smoothness is coated with a soln. contg. 3-15wt% nitrocellulose having 10.7- 12.2% nitrogen content by means of a spin coater under conditions of 25-30 deg.C casting temp., 5-10cc extent of casting and 500-3,000r.p.m. number of revolutions of the spinner to form a thin nitrocellulose film of 0.5-3mum thickness. A frame is adhered to the film, and the film is immersed in water for >=15min to strip the substrate. The film is then taken out of the water and dried. The thin nitrocellulose film can be stretched tight on the frame.
申请公布号 JPS6035733(A) 申请公布日期 1985.02.23
申请号 JP19830144384 申请日期 1983.08.09
申请人 ASAHI KASEI KOGYO KK 发明人 FUKUMITSU YASUNORI;KOUNO MITSUO
分类号 B29C41/12;B29K1/00;B29L7/00;G03F1/00;G03F1/62;H01L21/027 主分类号 B29C41/12
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