发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT WAFER AND MASK FOR MANUFACTURING THE SAME
摘要 PURPOSE:To facilitate assembly and environmental tests by a method wherein, when a plurality of rectangular chips with different chip sizes are formed on one semiconductor substrate, a plurality of the chips of one type and a plurality of the chips of another type are formed separately with a scribing line at their boundary in such a manner that the two types of chips touch with each other at their corners and vacant regions formed by above method are removed. CONSTITUTION:When chips of LSI-A and chips of LSI-B, which have chip sizes different from each other, are formed on the same semiconductor substrate, at first LSI-A chips are formed above a scribing line, which is used as a boundary, using one type of mask. Then LSI-B chips are formed below the scribing line so as to make corners of LSI-B chips touch the corners of LSI-A chip using another type of mask. Thus, the formation of these LSI chips is made easier. With this method, vacant regions 2 are formed above the scribing line and between LSI-A chips and vacant regions 3 are formed below the scribing line and between LSI- B chips, but these regions are unnecessary parts and cut off at the time of scribing.
申请公布号 JPS6034016(A) 申请公布日期 1985.02.21
申请号 JP19830142907 申请日期 1983.08.04
申请人 NIPPON DENKI KK 发明人 TAKEGAWA TOUJIROU
分类号 G03F1/00;G03F1/54;H01L21/027;H01L21/30 主分类号 G03F1/00
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