| 摘要 |
PURPOSE:To maintain highly saturated magnetic flux density and to enhance anti-abrasiveness by forming a film with 5-30wt% of Ni, 5-16wt% of Si, 0.01-10wt% of specific metal Ma, and the rest of Fe. CONSTITUTION:A magnetic thin film is formed of Ni, Si, Ma, and Fe. The ratio is 5-30wt% of Ni, 5-16wt% of Si, and 0.01-10wt% of Ma. At least, the Ma must be one sort of plutinum family element and Cr. The magnetic thin film is formed on a ceramic, glass, resin, metallic etc. substrate by evaporation method, thereby maintaining highly saturated magnetic density and enhancing anti-abrasiveness. |
