| 摘要 |
PURPOSE:To obtain spacers formed in a fine size by forming resist patterns on the transparent insulating coat of a thin metal plate, etching off said film except the resist patterns, peeling off the resist patterns, and finally etching off the thin metal plate. CONSTITUTION:A thin plate 1 of a metal, such as Cu or Ni, having about 0.5mm. plate thickness is coated with a transparent insulating film 2 of SiO2 or Al2O3 or the like, and on this coat 2, resist patterns 3 each being about 1mum wide and 50mum. Then, the insulating coat 2 is patterned by executing physical etching, such as plasma etching using the patterns 3 as masks. The resist patterns 3 are removed, leaving the patterns 4 of the coat 2 to be formed into spacers. Fine spacers 10 are finally obtained by chemically etching the patterns 4 to remove the plate 1. Hence, the cell thickness can be reduced and responsiveness can be enhanced in speed. |
