| 摘要 |
PURPOSE:To discover a flaw or a defect in a used photo-mask, etc. easily by viewing a semiconductor chip already manufactured by previously giving an information displaying a positioning at any position of a wafer of the chip onto the semiconductor chip. CONSTITUTION:A photo-mask 1 for etching is superposed while coating a large number of IC chips 2 fitted to a semiconductor wafer. Mask position informations 3 are each given previously to the IC chips 2 at that time, and a defective position 5 corresponding to a flaw or a defect 4 is also generated on the chip 2 when there is the flaw or the defect on the mask 1. ICs returned as defectives are investigated and formations with regard to the place of manufacture of the ICs are identified, and the flaws or defects of the mask are detected by the storage of data, thus improving the quality of IC products. |
