| 摘要 |
Photolithographic materials for use in the production for example of microelectronic circuits and sensitizing and printing elements in offset printing plates show marked improvement in sensitivity, non-critical outline developement and good shelf life as well as high resolving power while remaining sensitive to exposure from a wide variety of radiation sources if comprising a carrier base and on the carrier base a thin homogeneous or emulsion layer of at least one photosensitive substance which is capable upon exposure to radiation of yielding a latent positive image and exhibiting photoselective capacity for dissolution in alkaline developer according to such image, the photosensitive substance being either unreactive with the carrier base on exposure to radiation or reactive with the carrier base and isolated from the carrier base by interposition of an intermediate layer which does not react with the photosensitive substance when the latter is exposed to radiation. The photographic material contains, at least when being developed, one or more materials selected from dyestuffs having the capacity for dyeing tannined cotton, dyestuffs having the capacity for dyeing synthetic fibres, compounds capable of acting as accelerators, antioxidants or age resistors in the vulcanization of elastomers and developing agents effective in the development of silver halide-based photographic materials.
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