| 摘要 |
<p>A method of generating overlying line deflection patterns on a substrate for security or authentication purposes or the like, and the resulting security device produced by the method, are provided. A first line deflection pattern is applied to the substrate producing a first visible image when overlain by a finding screen. A second line deflection pattern is applied to the substrate so as to overlie at least a substantial portion of the first line deflection pattern. The second line deflection pattern produces a second visible image when overlain by a finding screen. The second line deflection pattern is given at least one visual characteristic (e.g., angle of orientation) different from the counterpart characteristic of the first line deflection pattern, thereby enabling discrimination of the two visible images with the aid of the finding screen.</p> |
