发明名称 PROCESS FOR PREPARING CARBONSTYRIL DERIVATIVES
摘要 Carbostyrils(I; R1 = H, lower alkyl, ph-lower alkyl, lower alkenyl, or lower alkyl; A = =C=O or =CH-OH, or -CH=CR2C or CH2CHR2; R2 = H or lower alkyl; B = lower alkylene; l= 1 when A = -CO-C or -CH(OH)- or = 0 or 1 when -CHCR2- or -CH2CHR2-; Z = =N-N3 or =C(R3R4); R3 = non-substituted or substituted ph, or lower alkylene dioxy- substituted ph, ph-lower alkyl or 1,2,3,4tetrahydronaphtyl; R4 = substituted ph; R5 = H, OH, or lower alkanoyl) useful as an antihistamine, were prepd. by the raction of II and III.
申请公布号 KR850000024(B1) 申请公布日期 1985.02.11
申请号 KR19810000730 申请日期 1981.03.06
申请人 OHTSUKA SEIYAKU CO.,LTD. 发明人 BANNO, KAZUO;OSAKI, MASAAKI;FUJOKA, TAKAHUMI;NAKAGAWA, KAZUYUKI
分类号 C07D215/22;A61K31/495;A61P23/00;A61P25/00;A61P25/18;A61P25/20;A61P43/00;C07D401/12;C07D405/12;(IPC1-7):C07D401/12 主分类号 C07D215/22
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