发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To prevent sticking of a sputtering film to the inside of a thin film forming chamber by placing perpendicularly a substrate and target so as to face statically each other, providing the open end of a cylindrical plate for stick- preventive plate covering the target near the substrate and making said plate slightly larger than the substrate. CONSTITUTION:A substrate 6 is held by a holding jig 5 in a thin film forming chamber 1 and a target 3 is held by a cathode 2 in such a way as to face perpendicularly each other. The target 3 is enclosed with a cylindrical stick- preventive plate 7 and a window 10 provided there is made slightly larger than the substrate 6 and is positioned near the substrate 10. The plate 7 is constituted of the same material as the target 3 and a heater 11 is wound around the plate. The sticking of a sputtering film to the wall ans jig in the chamber 1 is prevented as far as possible. If a partition plate 8 is attached near the target 3, the sputtering film sticking to the inside of the plate 7 is contained into a groove 9 even if said film is tripped from the plate.
申请公布号 JPS6026659(A) 申请公布日期 1985.02.09
申请号 JP19830135599 申请日期 1983.07.25
申请人 NICHIDEN ANELVA KK;NIPPON DENSHIN DENWA KOSHA 发明人 KITAHARA HIROAKI;TAKAHASHI NOBUYUKI;SUGIMOTO RIYUUJI;SAITOU KUNIO
分类号 C23C14/06;C23C14/34;C23C14/56;H01L21/203;H01L21/285;H01L21/31 主分类号 C23C14/06
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