| 摘要 |
PURPOSE:To improve the reproducibility of a process, and to operate a device stably by feeding back a travelling wave output of high-frequency power fed to plasma and changing a set power value so that the travelling wave output is made constant. CONSTITUTION:Discharge power set by a discharge power setting circuit 7 is inputted to a high-frequency power supply circuit 4, said power is applied to a lower electrode 2 in an etching chamber 1 through a matching circuit 6 and a power measuring circuit 8, and plasma is generated to etch the surface of a wafer 5. Discharge power is fed to a + terminal for a comparison circuit 9 and a travelling wave output of high-frequency power to a - terminal and the discharge power and travelling wave output are compared. When said travelling wave output is higher than desired power, said travelling wave output is fed back to the discharge power setting circuit 7 so as to lower a discharge power set value, and the set value is changed so that said travelling wave output is made constant. |
