| 摘要 |
<p>PURPOSE:To prevent the generation of an erroneous decision due to various dummy defects as well as to enable to perform a high speed inspection by a method wherein the inspection is performed by frame unit, and when a decision that there is a defect is given by a defect detecting means, an inspection is performed again by changing the condition of inspection using the defect-detecting means. CONSTITUTION:The photomask 12 which is the object to be inspected is placed on a sample stand 11, a beam of light emitted from a light source 16 is made to irradiate it, the transmitted light is received by a signal detecting part 17, and the detection signal is inputted to a detection judging part 19. The irradiation position of the light is measured by a stage position judging part 15, and the coordinate of said measurement and the reference data of the pattern obtained from the design data of the photomask 12 are inputted to a reference signal generator 18. The reference signal is sent to the defect judging part 19, and they are compared with the measured value by the judging part 19. When a decision that there is a defect is given, the condition of inspection is changed by a computer 13, the reference signal to be outputted from the reference signal generator 18 is changed, and a judgement is given again by the defect judging part 19.</p> |
