发明名称 ANTI-FOGGING METHOD OF IRRADIATION LIGHT SOURCE LAMP IN PHOTOCHEMICAL REACTION APPARATUS
摘要 PURPOSE:To prevent the adhesion of a reaction product to the surface of a lamp, by inserting a plate having a large number of fine pores between the irradiation light source of a reaction apparatus and a photochemical reaction vessel in parallel to a light direction. CONSTITUTION:A plate 2 having a large number of fine pores is mounted between an irradiation light source chamber 10 for reaction and a photochemical reaction vessel 4. In this state, valves 5, 6 are opened and the photochemical reaction vessel 4 and the irradiation light source chamber 10 for reaction are highly evacuated and, after the valves 5, 6 are closed, dilution gas is introduced into the light source chamber 10 from a valve 9. In the next step, a valve 7 is opened and the dilution gas is exhausted through the plate 2 having a large number of fine pores by a large capacity exhaust apparatus 11. By this method, the pressure difference of the dilution gas is generated between the lamp chamber 10 and the reaction vessel 4 and the dilution gas is blown toward a substrate 3 in a beam like state from the plate 2 having a large number of fine pores.
申请公布号 JPS6025539(A) 申请公布日期 1985.02.08
申请号 JP19830134855 申请日期 1983.07.23
申请人 KOGYO GIJUTSUIN (JAPAN) 发明人 ITOU UICHI;KUMADA KEN
分类号 B01J19/12 主分类号 B01J19/12
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