METHOD AND DEVICE FOR GENERATING ION BEAM

摘要

PURPOSE:To form a thin film having a particularly good characteristic with good reproducibility by sputtering targets with the plasma generated between the targets facing each other and leading the ionized particles generated by the sputtering to the outside of the targets by an electric field effect. CONSTITUTION:A magnetic field is formed of a magnet coil 3 in the direction perpendicular to the surfaces o targets T1 and T2 facing each other in parallel and gamma electron is migrated back and forth between the targets T1 and T2 to form plasma between the targets T1 and T2, thereby sputtering the targets. The particles driven off the targets T1, T2 in a spattering part A are accelerated by an accelerating electrode 13 in the cathode descending part of the lower target T2 and are passed through small holes 11, 12 after the particles are decelerated by the electric field formed between the grids G and the target T2. The led out ion beam 10 is effectively focused by the effect of the electric field E formed on the lead-out B side and is made incident to a substrate S by having the energy equivalent to the potential difference between the substrate S and the plasma.