HIGH-FREQUENCY SPUTTERING METHOD FOR ELECTRIFIABLE MATERIAL

摘要

PURPOSE:To form a coated film of an electrifiable material which is less in defect and less in mixing an ion being a sputtering gas by biasing a coating substrate and the coated film in the positive. CONSTITUTION:A bias electric power source 21 is connected to a substrate electrode 17 and both a coating substrate 18 fitted to the electrode 17 and a coated film 20 formed on the substrate 18 are biased in the positive. In this state, the coated film 20 of an electrified material is formed on the above- mentioned substrate 18 by performing the high-frequency sputtering.