发明名称 SUPPLYING APPARATUS OF ABRASIVE FOR POLISHING
摘要 PURPOSE:To polish stably by charging a high-concn. polishing abrasive into a tank, diluting continuously with demineralized water, supplying, and controlling the supply of an aq. soln of caustic soda with the pH value of the diluted soln. of the abrasive detected by a pH detector. CONSTITUTION:A supplying apparatus of an abrasive for polishing is constituted of an abrasive supply tank 1 provided with a flowmeter 2 capable of supplying a fixed amt. with solenoid valves 3 and 6, a supply pipe 4 of demineralized water for dilution and washing, and a piping for mixing the abrasive and the demineralized water from the tank 1 and the pipe 4. A supply pipe for supplying an aq. soln. of caustic soda from an aq. soln. of caustic soda supply tank 9 equipped with a flowmeter 10 capable of supplying a fixed amt. with a solenoid valve 8 is connected to the piping. The supply of the aq. soln. of caustic soda is controlled with the pH value of the diluted abrasive detected by a pH detector 7.
申请公布号 JPS6021386(A) 申请公布日期 1985.02.02
申请号 JP19830127242 申请日期 1983.07.13
申请人 TOSHIBA CERAMICS KK;TOSHIBA KK 发明人 KURIHARA SEIJI;KINOSHITA MASAHARU
分类号 B24B57/00;C23F3/00;H01L21/304 主分类号 B24B57/00
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