首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
FORMATION OF METAL OXIDE MASKS, ESPECIALLY BY REACTIVE ION ETCHING
摘要
申请公布号
EP0056845(B1)
申请公布日期
1985.01.30
申请号
EP19810108438
申请日期
1981.10.16
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
MATHUNI, JOSEF, DR. DIPL.-PHYS.;UNGER GEB. LEE, KARIN
分类号
H01L21/302;G03F7/09;G03F7/40;H01L21/033;H01L21/3065;(IPC1-7):H01L21/00
主分类号
H01L21/302
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Optical scanning device
Writing pen and recorder with built in position tracking device
Picture frame system with telescoping support
Control algorithm for a yaw stability management system
Construction machinery
Lateral displacement multiposition microswitch
Park brake for a disc brake system and disc brake system incorporating same
Sending messages in response to events occurring on a gaming service
Modular converter unit
Accessing items of architectural state in a data processing apparatus
Lever switch
Printed circuit board which can be connected with pin connector and method of manufacturing the printed circuit board
Process for the production of mesitylene
Manufacture of conjugated linoleic salts and acids
Combination of amines and vanadium (IV)/(V) compounds for the treatment and/or prevention of diabetes mellitus
Collagen/polysaccharide bilayer matrix
Hydrogenation of chemically derived 1,3-propanediol
Performance adder for tracking occurrence of events within a circuit
Fuel filter and fuel supply system
Composition for treating leather containing aqueous polymer dispersions, film-forming in the absence of organic solvent