| 摘要 |
PURPOSE:To form the patterning of a monomolecular film with precision by dipping a substrate on which the patterning is formed in an aq. soln. with a monomolecular film formed on the surface, and forming a monomolecular film on the part of the substrate imparted with hydrophobicity. CONSTITUTION:The patterning is formed in an optional shape on the glass substrate 5 by a photoresist 8, and the substrate is dipped in a soln. 9 of stearyltrichlorodisilane in toluene. The substrate 5 is then dipped in an acetone soln. to release the photoresist 8 by ultrasonic cleaning, and the hydrophobic patterning 10 is formed on the substrate 5. The substrate 5 having the hydrophobic patterning is vertically dipped in an aq. soln. 1 with the monomolecular layer 2 on the surface, and the monomolecular film is deposited on only the hydrophobic part. As a result, the monomolecular film is formed on the substrate 5 in an optional pattern. |
