发明名称 RASTER TYPE BEAM DRAWING APPARATUS
摘要 PURPOSE:To simplify chip data making and reduce the drawing time and improve the pattern accuracy by a method wherein imaginary chip data are made in accordance with chip arrangement data and the drawing of one turn along the Y-direction on the material on which a pattern is to be drawn is performed during the one turn driving along the Y-direction by an X-Y stage. CONSTITUTION:Driving of an X-Y stage 11 along the Y-direction is started in accordance with the position data from a position measurement circuit 30. Before the start of driving, pattern data are read out of a control data memory apparatus 21 and dot pattern data are generated by a dot pattern generating circuit 23 and stored in a memory 24. In that case, if an instruction to make imaginary chip data in accordance with chip arrangement data is given, an imaginary chip control circuit 32 controls at least one of the dot pattern generating circuit 23 and a dot pattern reading out circuit 25 to produce the imaginary chip data. Then ON-OFF control of a beam by a blanking circuit 27 and deflection scanning control of the beam by a deflection circuit 28 are carried out and one turn of a beam scanning along the X-direction is completed.
申请公布号 JPS6017915(A) 申请公布日期 1985.01.29
申请号 JP19830125956 申请日期 1983.07.11
申请人 TOSHIBA KK 发明人 NOMA AKIRA
分类号 G03F7/20;H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 G03F7/20
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