| 摘要 |
PURPOSE:To form a resist having superior adhesive strength to a substrate, superior heat resistance, dry etching resistance and resolution and to regulate easily easily the sensitivity to the wavelengths of light for exposure by using a specified hydroxystyrene polymer as a component of a resist. CONSTITUTION:A hydroxystyrene polymer represented by the formula (where CM is a vinyl monomer, (l) is an arbitrary number including 0, and Z is halogen, -SO3H, -NO2, -NO, -CH2OH, -CH2Cl, -CH2Br or the like) is used as a component of a resist. |
