| 摘要 |
PURPOSE:To improve the accuracy of real patterns by a method wherein a joint part pattern, by which a jointing position of an electron beam can be confirmed, is provided in each chip in a mask or a wafer in addition to the real pattern. CONSTITUTION:A fine square joint part pattern 10, which shows the joint, is provided to the left end of a real pattern at the joint part between one stripe 4 and the next stripe 4 of a chip part 2. Real patterns are successively exposed while the respective joint part patterns 10 which show the joint parts of the stripes 4 are being exposed over the whole chip parts 2 of a mask 1. Discrepancy between two stripes at the joint part can be noticed by discrepancy of the joint part patterns 10 and the accuracy can be confirmed by the accuracy of the joint parts over the whole chip parts 2 of the mask 1. The joint part patterns 10 are provided to all chip parts 2 of the mask 1 and the long time deflection of an electron beam can also be secured. |
