METHOD AND DEVICE FOR FORMING THIN FILM

摘要

PURPOSE:To form a thin film contg. a material which is difficult to be supplied as a target by a sputtering method by forming the material which is difficult to be vacuum-evaporated to a thin film by a sputtering method and the material which is difficult to be manufactured into a target into a thin film by a vacuum deposition method. CONSTITUTION:A thin film is formed on a substrate 38 by carring out simultaneously or alternately a stage for forming a sputtered thin film in which the thin film is formed by driving off target-constituting atoms from the surface of a target 36 by the bombardment of high energy ion in a vacuum vessel 31 and depositing the atoms on the surface of the substrate 38 and a stage for forming a vacuum-deposited thin film in which the thin film is stuck and formed on the surface of the substrate 38 by disposing an evaporating source 34 contg. a material 37 for vapor deposition in the same vessel 31 and evaporating the material 37 by heating, thereby depositing the same on the substrate.