| 摘要 |
PURPOSE:To enable automatically continuous development treatment of the sample, and to enable to enhance working efficiency and to enhance the development treatment effect of a semiconductor manufacturing device by a method wherein a developing part is constructed of a developing tank and a transferring means, a developer held at a regulated temperature is supplied to the developing tank, and a developer deterioration detecting part is annexed. CONSTITUTION:A wafer 1 completed with exposure is transferred into a housing 3 according to a loader belt 2, and transferred on the wafer holder 10 of a developing part 6 according to a belt 13. The wafer holder 10 moves downward to immerse the wafer 1 in a developer in a developing tank 9. When the prescribed hours elapsed, a pusher operates to transfer the wafer 1 to the right side, and the wafer is transferred on a wafer holder 11 from the wafer holder 10. The wafer holder 11 moves upward to carry up the wafer 1 over the developing tank 9. During development thereof, the inside of the tank 9 is held at a fixed liquid quantity according to a treatment liquid flow rate automatic control system 18, and moreover held at a fixed liquid temperature according to a liquid temperature regulator 21. Moreover, the deteriorated condition is monitored according to a liquid temperature regulator 21. Moreover, the deteriorated condition is monitored according to a deterioration detecting part 26. Moreover, the inside of the housing 3 is held in a nitrogen gas atmosphere. |
