| 摘要 |
PURPOSE:To obtain the titled film having excellent electron-beam curability, adhesivity and light resistance, by coating a film substrate with a composition containing a vinyl-containing polymer and a specific thiol compound and free of a photopolymerization initiator, and polymerizing the composition with electron ray. CONSTITUTION:The objective pressure-sensitive adhesive film is manufactured by applying a composition containing (A) 100pts.wt. of a vinyl-containing polymer (e.g. a polymer obtained by copolymerizing ethyl acrylate, glycidyl methacrylate, etc., and reacting the copolymer with acrylic acid, etc. in the presence of a polymerization inhibitor and a catalyst to introduce vinyl group to the copolymer) and (B) 5-40pts.wt. of a thiol compound obtained by the reaction of (i) a dithiol (e.g. hexamethylenedithiol) and (ii) a diisocyanate (e.g. hexamethylene diisocyanate) and free of a photo-polymerization initiator, to a film substrate, and polymerizing the composition with electron radiation of preferably of 100-300keV.
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