| 摘要 |
PURPOSE:To extend the life of a vacuum evacuating system by separating said system to two lines; for film formation and for dry etching and passing the waste gas from a reaction chamber through a filter without through a trap in the former and through the filter in the latter. CONSTITUTION:An evacuating system of a device which performs film formation and dry etching by a vapor phase method has a filter 10, a trap 11 and an evacuating pump 3 in the system. The waste gas from a reaction chamber 1 of said device is passed through a filter 10 to an evacuating pump 3 without through a trap 11 in the case of performing film formation. On the other hand, the waste gas is passed through the trap 11 and if necessary through the filter 10 to the pump 3 in the case of performing dry etching. |
