| 摘要 |
PURPOSE:To enable easy setting of a highly accurate and uniform interval even through it is extremely small by installing a spacer on one of a pair of parallel plate electrodes and regulating the interval between the both electrodes with the spacer. CONSTITUTION:In a chamber 1, an upper electrode 4 and a lower electrode 5 which are a pair of plate electrodes placed face to face in parallel are installed. The electrode 4 is fixed on the chamber 1 with a support axis 6 and on the circumference of the electrode 4, e.g., a ring wall 7 which constitutes a spacer is fixed downwards. The electrode 5 is supported by a suppoting axis 10 and on the upper surface center of the electrode, an object 11 to be etched can be loaded. At the lower end of the support axis 10 outside of the chamber 1, an up-and-down movement mechanism 12 is also provided whereby the support axis 10 and the electrode 5 can be moved vertically. In this construction, the electrode 5 is moved vertically by the operation of the mechanism 12 and stopped when the lower end of the spacer 7 touches the upper surface circumference of the electrode 5. In this way, the electrodes 4 and 5 are set with a uniform interval equal to the height l of the spacer 7 face to face each other. |
