发明名称 KATHODENZERSTAEUBUNGSEINRICHTUNG MIT EINER VORRICHTUNG ZUR MESSUNG EINES KRITISCHEN TARGET-ABTRAGES.
摘要 A cathode sputtering device for coating the surfaces of components in a vacuum chamber, which contains a noble gas, includes a target electrode and an anode. A magnetic field is concentrated on the cathode in order to intesify the plasma discharge. A probe is located in the chamber to measure the critical target discharge. The probe pref. contains a gas whose drop in pressure makes the critical target discharge.
申请公布号 DE3775667(D1) 申请公布日期 1992.02.13
申请号 DE19873775667 申请日期 1987.09.09
申请人 PHILIPS AND DU PONT OPTICAL DEUTSCHLAND GMBH, 3000 HANNOVER, DE 发明人 EGGERS, DIPL.-ING., GERHARD, W-3004 ISERNHAGEN 1, DE;LANGOWSKI, DIPL.-PHYS., HORST-CHRISTIAN, W-3000 HANNOVER 1, DE
分类号 C23C14/52;C23C14/54;(IPC1-7):C23C14/52 主分类号 C23C14/52
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