KATHODENZERSTAEUBUNGSEINRICHTUNG MIT EINER VORRICHTUNG ZUR MESSUNG EINES KRITISCHEN TARGET-ABTRAGES.
摘要
A cathode sputtering device for coating the surfaces of components in a vacuum chamber, which contains a noble gas, includes a target electrode and an anode. A magnetic field is concentrated on the cathode in order to intesify the plasma discharge. A probe is located in the chamber to measure the critical target discharge. The probe pref. contains a gas whose drop in pressure makes the critical target discharge.
申请公布号
DE3775667(D1)
申请公布日期
1992.02.13
申请号
DE19873775667
申请日期
1987.09.09
申请人
PHILIPS AND DU PONT OPTICAL DEUTSCHLAND GMBH, 3000 HANNOVER, DE