发明名称 Photosensitive materials having improved antistatic property
摘要 A silver halide photosensitive material having an improved antistatic property is disclosed, comprising a base support having thereon an electrically conductive layer comprised of fine particles of a crystalline metal oxide selected from the group consisting of ZnO, TiO2, ZrO2, SnO2, Al2O3, In2O3, SiO2, MgO, BaO and MoO3 or a composite oxide thereof dispersed in a binder, the light scattering efficiency of said photosensitive material being 50% or less. The electrically conductive layer gives excellent antistatic properties even under low humidity preventing the generation of static charges without damaging photographic properties of the silver halide photosensitive material.
申请公布号 US4495276(A) 申请公布日期 1985.01.22
申请号 US19810253499 申请日期 1981.04.13
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TAKIMOTO, MASAAKI;SAIDA, TAKASHI;MURATA, MASATAKA
分类号 C09K3/16;G03C1/38;G03C1/85;(IPC1-7):G03C1/78 主分类号 C09K3/16
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