发明名称 METHOD FOR FORMATION OF LSI ACCEPTION MAP
摘要 PURPOSE:To enable to form the non-defective map of LSI covering the whole region of an IC wafer by a method wherein a testing device in addition to an LSI circuit is assembled in an LSI chip, the defectiveness of IC wafers is tested, and the result showing acception or rejection is inputted to a holding device. CONSTITUTION:An LSI 2 is compored of an LSI circuit 10 having the circuit constitution same as that of the LSI and a testing circuit 30 which is arranged within the LSI 2 adjoining to the LSI circuit 10. The application pattern for testing is inputted to the block 10 to be tested as a test block, and the test circuit 30 with which the accesption and rejection of the block 10 to be tested will be judged by comparing the output of the LSI 2 with certain expected pattern is formed. The acception and rejection of the LSI 2 are supplied to the result holding device, which is a fail flag 21, provided in the scribing region of the IC wafer 1 as the result of test. The acception map of the LSI ranging to the whole surface of the wafer 1 can be formed by inputting a shift signal SH into the fail flag pertaining to the test result held in said fail flag 21 and by repeating a shifting operation successively.
申请公布号 JPS609135(A) 申请公布日期 1985.01.18
申请号 JP19830117407 申请日期 1983.06.29
申请人 FUJITSU KK 发明人 HASHIGUCHI KOUJI
分类号 H01L21/66;H01L21/82;(IPC1-7):H01L21/66 主分类号 H01L21/66
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