| 摘要 |
PURPOSE:To form a superior resist micropattern good in adhesive strength to a substrate without deteriorating sensitivity and resolution by using 2-layer resist films each made of a specified polymer. CONSTITUTION:A <=0.1mum thin film made of one kind of polymer selected from a group B is formed on a substrate, and on this film another 0.1-0.2mum thin film made of one kind of polymer selected from a group A is formed to obtain 2- layer thin films. As the polymer of the group A, a homopolymer of a monomer represented by formula I (R1 is methyl or Cl, and R2 is halogenated alkyl) or a copolymer of it and another vinyl monomer, preferably, a polymer represented by formula II in which R3 is -CH2CF3, -CH(CH3)CF3, -C(CH3)2CF3, CH2CF2CHF2, or -CH(OCH3)CF3. The polymers of the group B are superior in solubility in org. solvents and adhesive strength to a substrate to said polymers of the group A, and they are decomposable with radiation, and a preferable monomer of them is represented by formula III in which R4 is 3-7 C alkyl. Such 2-layer resist films can be formed into a superior micropattern good in adhesive strength to the substrate with a small amt. of radiation, and can be used for microfabrication of a semiconductor substrate, a mask substrate, etc. |
