| 摘要 |
A mask (reticle) washing apparatus for cleaning a mask (1) used in production processes of semiconductor integrated circuits (ICs), which allows the cleaning of a mask without the use of a strong oxidizing agent or strong alkaline agent. The mask washing apparatus (43) is constructed with an airtight chamber (5) arranged vertically lengthways, and comprises a washing room (40) and a drying room (7) which are separated by a shutter (11). A drain (21) and an exhaust duct (4) are located at the bottom of the chamber. A washing process is performed in a lower part of the chamber (40) and a drying process is performed in the upper part of the chamber (7). A clean air stream flows from the upper part to the lower part of the chamber, preventing contamination of the mask during the drying process. Consequently, the mask is cleaned perfectly, enabling improved reliability and yield of manufactured IC devices. |
