| 摘要 |
PURPOSE:To enable to inspect the reticles whereon patterns are microscopically formed at the data base of the quantity of information which can be memorized in a magnetic tape by a method wherein one or more of patterns are considered as the object of inspection, and one or more of them are removed from the object of inspection. CONSTITUTION:Patterns 2a and 2b of the same pattern are arranged side by side. Accordingly, when the pattern 2b is comparatively inspected with the pattern 2a using a mask comparison inspection device, the inspection of the pattern 2b can be excluded when a reticle tester is used, and the quantity of information of data base to be recorded in a magnetic tape is reduced in the amount corresponding to the pattern 2b, thereby enabling to leave the quantity of the information for the pattern 2a and 3 as shown by the slant-lined area in the diagram. As a result, the quantity of information exceeding the accommodating capacity of the magnetic tape is reduced to the quantity of information which can be accommodated. The pattern 2b can be excluded from inspection by designating two points of inspection exception limit designation coordinates P (X1, Y1) and Q (X2, Y2) in the formation surfaces of the patterns 2a, 2b and 3 of the reticle 1, and the region surrounded by the four points of coordinates (X1, Y1), (X2, Y1), (X2, Y2) and (X1, Y2) are considered as the inspection exception regions. |
