DEVICE FOR PRODUCING HYDROGENATED AMORPHOUS SILICON

摘要

PURPOSE:To provide a titled device which forms pinhole-free hydrogenated amorphous silicon by the constitution in which a leak line is provided to a gas supply system for supplying a gaseous raw material to a glow discharge device to prevent intrusion of impurities into the gaseous raw material. CONSTITUTION:A gaseous raw material contg. silane, hydrogen, etc. is introduced from a gas supply line into a glow discharge device which is evacuated by a vacuum evacuating system and hydrogenated amorphous silicon is laminated on a base by the decomposition of the gas by glow discharge. A leak system 14a which introduces an inert gas to a gas supply line 12 is provided via three-way cock 12C to said supply line with such device. The cock 12C is changed over to stop supplying the gaseous raw material and to introduce an inert gas such an N2 to restore the atm. pressure in the device upon ending of the lamination operation onto the base. The base laminated with the hydrogenated amorphous silicon layer is taken out. Intrusion and sticking of suspended impurities to the gas supply system are obviated by the above-mentioned constitution and the supply of the gaseous raw material contg. no impurities in the succeeding cycle is made possible.