发明名称 HIGH RESOLUTION HIGH SENSITIVITY SOLID-STATE IMAGE SENSOR
摘要 PURPOSE:To improve the sensitivity and to reduce the Moire fringe effect by forming at least one of the 1st and 2nd electrode pairs into a wavy pattern being in opposite phase to adjacent electrodes mutually. CONSTITUTION:The electrode 34 extended in the horizontal direction of a solid- state image sensor is formed in zigzag pattern and has a phase of 180 deg. with adjacent electrode 34. Then the train of the octagonal expanded regions is formed in zigzag to the adjacent train at a regular interval. An octagonal source diffusion layer 31 is formed on the expanded region. A drain diffusion layer 32 and a drain contact region 35 are formed on a small region between adjacent expanded regions. The source diffusion layer 31 and the drain diffusion layer 32 are spread over a semiconductor substrate up to a position near the edge of the electrode 34 expanded in horizontal direction and a gate region 33 is formed between the electrode 34 and a thin oxide layer while the electrode 34 expanded horizontally is separated from the surface of the substrate by the thin oxide layer.
申请公布号 JPS605683(A) 申请公布日期 1985.01.12
申请号 JP19840110853 申请日期 1984.06.01
申请人 FUJI SHASHIN FILM KK 发明人 OOCHI SEIJI
分类号 H01L27/146;(IPC1-7):H04N5/335;H01L27/14;H04N9/04 主分类号 H01L27/146
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