发明名称 |
HIGH RESOLUTION HIGH SENSITIVITY SOLID-STATE IMAGE SENSOR |
摘要 |
PURPOSE:To improve the sensitivity and to reduce the Moire fringe effect by forming at least one of the 1st and 2nd electrode pairs into a wavy pattern being in opposite phase to adjacent electrodes mutually. CONSTITUTION:The electrode 34 extended in the horizontal direction of a solid- state image sensor is formed in zigzag pattern and has a phase of 180 deg. with adjacent electrode 34. Then the train of the octagonal expanded regions is formed in zigzag to the adjacent train at a regular interval. An octagonal source diffusion layer 31 is formed on the expanded region. A drain diffusion layer 32 and a drain contact region 35 are formed on a small region between adjacent expanded regions. The source diffusion layer 31 and the drain diffusion layer 32 are spread over a semiconductor substrate up to a position near the edge of the electrode 34 expanded in horizontal direction and a gate region 33 is formed between the electrode 34 and a thin oxide layer while the electrode 34 expanded horizontally is separated from the surface of the substrate by the thin oxide layer.
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申请公布号 |
JPS605683(A) |
申请公布日期 |
1985.01.12 |
申请号 |
JP19840110853 |
申请日期 |
1984.06.01 |
申请人 |
FUJI SHASHIN FILM KK |
发明人 |
OOCHI SEIJI |
分类号 |
H01L27/146;(IPC1-7):H04N5/335;H01L27/14;H04N9/04 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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