| 摘要 |
PURPOSE:To enable detection of transferred images even of microscopic foreign matters by forming register marks in advance on the wafer or the like on which a test pattern is to be transferred, and registering the photographed image of a reticle using this mark. CONSTITUTION:A mobile stage 5 is stepwise moved with a driving member 6 and a coordinate position measuring meter 7 and the transfer region PA3 of an inverted reticle R3 is illuminated, and these operations are repeated to transfer the inverted pattern successively on a wafer W. Next, the right pattern of a reticle R2 to be checked is registered on this wafer W to transfer the pattern. When foreign matters have attached, they intercept the illumination light to cause an unexposed part on the reticle R2. The inverted pattern is thus overlaid on the right pattern and they are transferred to a positive resist layer 100. This wafer W is taken out and exposed, resulting in leaving the unexposed part as a residual protuberant resist P on the wafer W. As a result, the transferred image of microscopic foreign matters can be detected. |
