| 摘要 |
PURPOSE:To improve an inspection yield by a method wherein a defect position on a mask to be inspected is detected and a position relation between another mask pattern used in another process in the same set and the defect position of the mask to be inspected is inspected and a quality of the tested mask is judged. CONSTITUTION:A mask 1 to be inspected and a judging mask 2 used in another process in a same set are positioned and set on a same X-Y stage 3. The mask 1 to be inspected is compared with design data 6 and inspected by a comparing and judging circuit apparatus 7 through an optical system 5. In order to judge, a detected defect is displayed on a monitor 10 and the identical position of the judging mask 2 is displayed superposed through an optical system 9. If the defect in the inspected mask 1 is found inside the pattern of the judging mask 2, the defect is practically not harmful for the application of the inspected mask and the judging mask. Therefore, if the defect 13 only is found, the inspected mask is judged to be satisfactory. With this constitution, when the defect 13 is detected, but if the defect 14 does not exist, the mask is judged to be satisfactory and the cost of the mask is reduced. |
