发明名称 |
SOLVENT-SOLUBLE ORGANOPOLYSILSESQUIOXANES, PROCESSES FOR PRODUCING THE SAME, AND COMPOSTIONS AND SEMICONDUCTOR DEVICES USING THE SAME |
摘要 |
An organopolysilsesquioxane having lower alkyl groups and alkenyl groups and, if necessary, aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalosilane, an alkenyltrihalosilane, and, if necessary, an aryltrihalosilane and/or a trihalosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, optionally in the form of a mixture with a compound which generates a crosslinking-reaction-active species upon irradiation with light or ionizing radiation. |
申请公布号 |
EP0076656(A3) |
申请公布日期 |
1985.01.09 |
申请号 |
EP19820305223 |
申请日期 |
1982.09.30 |
申请人 |
JAPAN SYNTHETIC RUBBER CO., LTD. |
发明人 |
NOZUE, IKUO;TOMOMITSU, OSAHIKO;YUMOTO, YOSHIJI;MATSUMURA, YOSHIO |
分类号 |
C08F2/46;C08G77/06;C08G77/20;G03F7/075;H01B3/46;H01L21/312 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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