发明名称 ALIGNMENT EXPOSURE DEVICE
摘要 PURPOSE:To improve a throughout in a manner that UV beams and DeepUV beams can be exchanged instantaneously without converting illumination optical systems, and to enhance even the working ratio on an installation by providing the two illumination optical systems for a UV light source and for a DeepUV light source and a second mirror. CONSTITUTION:With a second mirror 3, the angle and attitude of the mirror 3 are converted at 90 deg., and it changes over beams from each illumination optical system 11, 21, and projects them to a condenser lens 4. Elliptical-concave-mirrors 6, 6 are fitted to each light source 1, 2, and each illumination optical system 11, 21 is constituted by first-mirrors 12, 22, filters 14, 24 and compound-eye-lenses 13, 23. Accordingly, the irradiating beams of the UV light source 1 and the DeepUV light source are change over instantaneously by changing the angle of the second mirror 3 to theta by previously adjusting the UV illumination optical system and the DeepUV illumination optical system on the starting of a device, and can be projected onto a mask 5 through the condenser lens 4.
申请公布号 JPS601830(A) 申请公布日期 1985.01.08
申请号 JP19830110583 申请日期 1983.06.20
申请人 NIPPON DENKI KK 发明人 FURUICHI MITSUHIRO
分类号 G03F9/00;H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 G03F9/00
代理机构 代理人
主权项
地址