发明名称 |
Dry Etching method and device therefor |
摘要 |
A dry etching method and device involve induction of a magnetic field having field lines perpendicular to an electric field by magnets which are arranged in the vicinity of a cathode within a reaction chamber, on the surface of the cathode being placed a sample to be etched by a plasma of an etchant gas.
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申请公布号 |
US4492610(A) |
申请公布日期 |
1985.01.08 |
申请号 |
US19830559857 |
申请日期 |
1983.12.12 |
申请人 |
TOKYO SHIBAURA DENKI KABUSHIKI KAISHA |
发明人 |
OKANO, HARUO;HORIIKE, YASUHIRO |
分类号 |
H01J37/34;(IPC1-7):H01L21/306;B44C1/22;C03C15/00;C23F1/02 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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