发明名称 ALIGNMENT APPARATUS
摘要 PURPOSE:To make it possible to set a wafer in a desired position by a method wherein one point between rotatable rollers is movably supported and pushing force is given to the supporting point for the rollers to be pressed against a wafer. CONSTITUTION:A wafer 4 being pneumatically supported above a wafer supporting plate 23 is moved toward driving rollers 2, 5, 6 and a rotating roller 3 by see-saw type pushing rollers 15-18 and is then rotated. At the moment when one end of an orientation flat 4' reaches the roller 15, the pushing component force exerts a moment against the wafer, which moment affecting in a reverse direction of the rotation is, however, small. On the other hand, the effective force required for moving the wafer 4 toward the roller 2 is great and hence a minimum value of the friction coefficient between the wafer 4 and the roller 2 is decreased. Just when the flat 4' contacts with each of the driving rollers 2, 5, 6, among which the two rollers 5 and 6 are returned to a state of free rotation in response to a signal transmitted from a device for optically detecting the flat 4' thereby to prevent any overrun given by the inertia of rotation.
申请公布号 JPS59228720(A) 申请公布日期 1984.12.22
申请号 JP19830103735 申请日期 1983.06.10
申请人 CANON KK 发明人 IIZUKA KAZUO;YABU SHIYUUICHI
分类号 G03F9/00;H01L21/027;H01L21/30;H01L21/68;(IPC1-7):H01L21/30 主分类号 G03F9/00
代理机构 代理人
主权项
地址