| 摘要 |
PURPOSE:To obtain the titled photosensitive material having superior antistatic property by incorporating condensation product of polyalkylene glycol and/or polyalkylene oxide with an org. compd. contg. active hydrogen atom, and a specified compd. CONSTITUTION:(A) 0.1-20g/l condensation product of polyalkylene glycol having >=250mol.wt. and/or polyalkylene oxide having >=250mol.wt. with an org. compd. having active hydrogen atoms (e.g. polypropylene oxide), (B) 0.1-1,000mg (per 1mol silver halide) compd. expressed by the formula ( I -III) [where R1 and R2 are H, (un)substituted (cyclo)alkyl, alkenyl, etc.; R3-6 are H, halogen, hydroxy, (un)substituted alkylthio, acylamino, etc.], and (C) compd. expressed by the formula (IV) [R7 is (un)substituted aliphatic group, aromatic group, hetercyclic group; A is -CO-, -SO2-; n is 0, 1], to a silver halide emulsion layer and/or nonsensitive intermediate layer.
|
