发明名称 |
METHOD AND APPARATUS FOR PRETREATING A SUBSTRATE, METHOD AND APPARATUS FOR PRETREATING A SUBSTRATE AND DEPOSITING A THIN METALLIC FILM THEREON |
摘要 |
<p>Deposition of continuous pin-hole free tellurium films with thicknesses to less than 150A on a suitable substrate is achieved by first pretreating the substrate prior to film deposition. Ion sputtering or bombardment of the substrate surface with an inert gas prior to tellurium evaporation creates a dense coverage of nucleation sites on the substrate which improves the adhesiveness and resistance to abrasion and oxidation of the deposited film while providing very thin pin-hole free films of uniform thickness and desired crystallite orientation.</p> |
申请公布号 |
EP0017360(B1) |
申请公布日期 |
1984.12.19 |
申请号 |
EP19800300764 |
申请日期 |
1980.03.12 |
申请人 |
XEROX CORPORATION |
发明人 |
CONNELL, NEVILLE G A;JOHNSON, RICHARD I |
分类号 |
C23C14/02;G11B7/243;G11B7/253;(IPC1-7):23C15/00;23C13/00;11B7/24 |
主分类号 |
C23C14/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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