发明名称 VACUUM TREATING DEVICE
摘要 PURPOSE:To improve the effect of plasma treatment, by providing a supporting part for positive electrode in a vacuum treating chamber with a liftable mechanism to adjust the distance between it and a negative electrode so that the distance between both the electrodes is adjusted depending upon the purpose of a material to be treated. CONSTITUTION:The rolled negative electrode 7 and the semicylindrical positive electrode 14 (liftable mechanism to adjust the distance between both the electrodes 7 and 14 is attached to the supporting part for the positive electrode) are set in the vacuum treating chamber 1, the material 26 to be treated such as vinyl chloride film, etc. is fed to the space between both the electrodes 7 and 14, so that the surface of the material to be treated is subjected to plasma treatment. The liftable mechanism preferably consists of the linear head 21 obtained by combining a rack-and-pinion mechanism with a driving means, and the stand 20 to support the linear head.
申请公布号 JPS59226028(A) 申请公布日期 1984.12.19
申请号 JP19830101417 申请日期 1983.06.06
申请人 NITTO DENKI KOGYO KK 发明人 TSUMURA AKIO;MIYAAKE NORIHARU
分类号 B01J3/02;B01J3/00;B01J19/08;B29C59/14;C08J7/00;(IPC1-7):C08J7/10 主分类号 B01J3/02
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