发明名称 PLATING THICKNESS MEASURING METHOD
摘要 PURPOSE:To measure a plating thickness with good accuracy according to fluorescent X-ray spectroscopy by using four or more of standard specimens, by performing operation by a formula showing a calibration curve having a specific correction term. CONSTITUTION:Three standard specimens are properly selected from four or more standard specimens of which plating thicknesses (x) are known to measure fluorescent X-ray intensities (n) while X-ray intensity n<infinity>, background n0 and absorption coefficient mu of a specimen having a thickness regarded as an indefinite thickness are calculated by formula (1). The plating thickness (x) of the other standard specimen and values n<infinity>, n0 and mu are substituted for the formula (1) to calculate the calculation value of fluorescent X-ray intensity and the difference DELTAn with the actually measured fluorescent X-ray intensity is calculated to form formulae (2), (3). The fluorescent X-ray intensity of the specimen is calculated to be compared with the fluorescent X-ray intensity value of each standard specimen and the formula of the corresponding DELTAn is selected from the formula (3) and, for example, the plating thickness (x) is calculated by formula (5).
申请公布号 JPS59225312(A) 申请公布日期 1984.12.18
申请号 JP19830101209 申请日期 1983.06.07
申请人 SEIKO DENSHI KOGYO KK 发明人 KOBATA HIROYUKI;YAMANAKA HIROHARU;KOMATSU SHIGEMI
分类号 G01B15/02;G01N23/223;(IPC1-7):G01B15/02 主分类号 G01B15/02
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