发明名称 PLASMA REACTION
摘要 PURPOSE:To avoid useless consumption of a reactive gas, an electric power and an abnormal discharge in a photoelectromotive force apparatus equipped with amorphous semiconductors by a method wherein a power supply to entrance electrodes and exit electrodes is controlled by synchronizing with the transfer of substrates. CONSTITUTION:A plurality of transfer units of substrates can be stored and transferred simultaneously in the 2nd plasma reaction chamber 10b. Entrance electrodes 28, 29 and exit electrodes 30, 31 which have a split electrode composition and the length of the substrate of one transfer unit are provided to an entrance and an exit of facing electrodes 17, 18 in the 2nd plasma reaction chamber 10b. A power supply to the entrance electrodes 28, 29 and the exit electrodes 30, 31 is controlled by synchro nizing with the transfer of the substrates 27a- 27j. With this method, a useless power supply to the electrodes where the substrates do not exist is cut off and a plasma reaction at such electrodes is stopped so that unnecessary consumption of a reactive gas is suppressed and at the same time the stay of frakes in the reac tion chamber is reduced.
申请公布号 JPS59225524(A) 申请公布日期 1984.12.18
申请号 JP19830101546 申请日期 1983.06.06
申请人 发明人
分类号 H01L21/302;H01J37/32;H01L21/3065;(IPC1-7):H01L21/302 主分类号 H01L21/302
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