发明名称 FLANGE OF VERTICAL-TYPE DIFFUSION CHAMBER
摘要 PURPOSE: A flange of a vertical-type diffusion chamber has O-ring insertion groove, prevents a fluctuation of O-ring(93), and achieves accurate sealing process. CONSTITUTION: A flange(360) of a vertical-type diffusion chamber forms O-ring insertion groove (363) to an external tube(40) mounting position, The O-ring insertion groove(363) is used to prevent a leakage. The external tube is mounted to the flange of a vertical-type diffusion chamber in order to perform a chemical vapor deposition process. A cross-section of the groove(363) has a round form. A cross-section of the groove(363) has a square form. Thereby, the flange of a vertical-type diffusion chamber has O-ring insertion groove, prevents a fluctuation of O-ring(93), and achieves accurate sealing process.
申请公布号 KR20000025468(A) 申请公布日期 2000.05.06
申请号 KR19980042564 申请日期 1998.10.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEO, SUN CHAE
分类号 H01L21/22;(IPC1-7):H01L21/22 主分类号 H01L21/22
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