发明名称 |
PRODUCTION OF HIGH POLYMER PHOTOCONDUCTIVE |
摘要 |
PURPOSE:To produce a photoconductive path having a three-dimensional pattern easily by forming a clad part prior to the polymerization and formation of arrays in a core part. CONSTITUTION:A substrate 2 is held by a supporting rod 3 under a photomask 1 having a circular or rectangular part preventing the transmission of light in its window and a vessel 4 is filled with a monomer mixture 5. When parallel ultraviolet light 6 is irradiated from the upper part of the vessel 4 and the substrate 2 is slowly lowered, the monomer on a part exposed through the window of the photomask 1 is photopolymerized and a polymer 8 having holes 7 is formed on the substrate 2 in accordance with the lowering of the substrate 2. If both the movement and replacement of the mask 1 are applied, an optional hole pattern is obtained. The substrate 2 is lowered by the supporting rod 3 coupled with a feeding mechanism interlocking with a motor. The polymer 8 polymerized up to necessary length and taken out from the mixture 5 is completely polymerized and resin having a refractive index higher than the polymer is injected into the holes 7 and hardened. Thus, the obtained polymer is removed from the substrate 2 and both the surfaces are polished. |
申请公布号 |
JPS59223403(A) |
申请公布日期 |
1984.12.15 |
申请号 |
JP19830097930 |
申请日期 |
1983.06.03 |
申请人 |
NIPPON DENSHIN DENWA KOSHA |
发明人 |
YAMADA TAKESHI;KUROKAWA TAKASHI |
分类号 |
C08F2/00;C08F2/48;G02B6/00;G02B6/04;G02B6/06;G02B6/13;(IPC1-7):G02B5/17;G02B5/14;G02B5/174 |
主分类号 |
C08F2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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